发明授权
US08118044B2 Single workpiece processing chamber with tilting load/unload upper rim
有权
单工件加工室具有倾斜载荷/卸载上缘
- 专利标题： Single workpiece processing chamber with tilting load/unload upper rim
- 专利标题（中）： 单工件加工室具有倾斜载荷/卸载上缘
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申请号： US11075099申请日： 2005-03-08
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公开(公告)号： US08118044B2公开(公告)日： 2012-02-21
- 发明人: Daniel J. Woodruff
- 申请人： Daniel J. Woodruff
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Perkins Coie LLP
- 代理商 Kenneth H. Ohriner
- 主分类号： B08B3/00
- IPC分类号： B08B3/00 ; B08B3/12 ; B08B6/00
摘要：
A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position.
公开/授权文献
- US20050199503A1 Single workpiece processing chamber 公开/授权日：2005-09-15
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