发明授权
- 专利标题： Spinous silica-based sol and method of producing the same
- 专利标题（中）： 二氧化硅基溶胶及其制备方法
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申请号： US11907318申请日： 2007-10-11
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公开(公告)号： US08118898B2公开(公告)日： 2012-02-21
- 发明人: Yoshinori Wakamiya , Hiroyasu Nishida , Yuji Tawarazako , Kazuaki Inoue , Osamu Yoshida , Akira Nakashima
- 申请人： Yoshinori Wakamiya , Hiroyasu Nishida , Yuji Tawarazako , Kazuaki Inoue , Osamu Yoshida , Akira Nakashima
- 申请人地址： JP Kanagawa
- 专利权人： JGC Catalysts and Chemicals Ltd.
- 当前专利权人： JGC Catalysts and Chemicals Ltd.
- 当前专利权人地址： JP Kanagawa
- 代理商 Manabu Kanesaka
- 优先权： JP2006-279204 20061012; JP2006-333574 20061211
- 主分类号： C09G1/04
- IPC分类号： C09G1/04 ; B01F3/12 ; C01B33/12
摘要：
The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.
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