发明授权
- 专利标题： Reflective photomask and method of fabricating, reflective illumination system and method of process using the same
- 专利标题（中）： 反光光掩模及其制造方法，反光照明系统及其使用方法
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申请号： US12656668申请日： 2010-02-12
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公开(公告)号： US08119309B2公开(公告)日： 2012-02-21
- 发明人: Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
- 申请人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
- 申请人地址： KR Suwon-si, Gyeonggi-do
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si, Gyeonggi-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2009-0010344 20090209
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F9/00
摘要：
A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption pattern on the capping layer, the light absorption pattern including at least one slit exposing the surface portion of the capping layer having the bent shape.
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