发明授权
US08119322B2 Method for producing self-aligned mask, articles produced by same and composition for same
有权
用于生产自对准面罩的方法，由相同制造的制品及其组合物
- 专利标题： Method for producing self-aligned mask, articles produced by same and composition for same
- 专利标题（中）： 用于生产自对准面罩的方法，由相同制造的制品及其组合物
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申请号： US12107889申请日： 2008-04-23
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公开(公告)号： US08119322B2公开(公告)日： 2012-02-21
- 发明人: Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
- 申请人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Scully, Scott, Murphy & Presser, P.C.
- 代理商 Daniel P. Morris, Esq.
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004 ; G03F7/40
摘要：
A method for forming a self-aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material being either photo or thermally sensitive; performing a blanket exposure of the substrate; and allowing at least a portion of the masking material to preferential develop in a fashion that is replicates the existing pattern of the substrate. The existing pattern may be comprised of a first set of regions of the substrate having a first reflectivity and a second set of regions of the substrate having a second reflectivity different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. Structures made in accordance with the method.
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