发明授权
- 专利标题: Photopolymer composition usable for lithographic plates
- 专利标题(中): 可用于平版印刷版的光聚合物组合物
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申请号: US12159287申请日: 2007-01-02
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公开(公告)号: US08119331B2公开(公告)日: 2012-02-21
- 发明人: Harald Baumann , Bernd Strehmel , Udo Dwars , Ursula Muller
- 申请人: Harald Baumann , Bernd Strehmel , Udo Dwars , Ursula Muller
- 申请人地址: DE Stuttgart
- 专利权人: Kodak Graphic Communications GmbH
- 当前专利权人: Kodak Graphic Communications GmbH
- 当前专利权人地址: DE Stuttgart
- 代理商 J. Lanny Tucker
- 优先权: DE102006000783 20060104
- 国际申请: PCT/EP2007/000009 WO 20070102
- 国际公布: WO2007/077207 WO 20070712
- 主分类号: G03F7/09
- IPC分类号: G03F7/09 ; G03F7/30 ; G03F7/004
摘要:
Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.
公开/授权文献
- US20090011363A1 Photopolymer Composition Usable for Lithographic Plates 公开/授权日:2009-01-08
信息查询
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