Invention Grant
- Patent Title: Sputtering target and manufacturing method therefor, and recordable optical recording medium
- Patent Title (中): 溅射靶及其制造方法和可记录光记录介质
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Application No.: US12971327Application Date: 2010-12-17
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Publication No.: US08124212B2Publication Date: 2012-02-28
- Inventor: Yoshitaka Hayashi , Noboru Sasa , Toshishige Fujii , Masayuki Fujiwara , Hiroshi Miura , Masaki Kato , Takeshi Kibe , Shinya Narumi
- Applicant: Yoshitaka Hayashi , Noboru Sasa , Toshishige Fujii , Masayuki Fujiwara , Hiroshi Miura , Masaki Kato , Takeshi Kibe , Shinya Narumi
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Cooper & Dunham LLP
- Priority: JP2006-055120 20060301; JP2006-213972 20060804
- Main IPC: B32B3/02
- IPC: B32B3/02
Abstract:
To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of the film formation for the improvement of productivity, which has a high intensity at the time of the film formation and which has a heightened packing density.
Public/Granted literature
- US20110143075A1 SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR, AND RECORDABLE OPTICAL RECORDING MEDIUM Public/Granted day:2011-06-16
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