Invention Grant
US08124947B2 Ion implanter having combined hybrid and double mechanical scan architecture
有权
离子注入机具有组合的混合和双机械扫描架构
- Patent Title: Ion implanter having combined hybrid and double mechanical scan architecture
- Patent Title (中): 离子注入机具有组合的混合和双机械扫描架构
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Application No.: US12554277Application Date: 2009-09-04
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Publication No.: US08124947B2Publication Date: 2012-02-28
- Inventor: Manny Sieradzki , Patrick Splinter , Bo H Vanderberg
- Applicant: Manny Sieradzki , Patrick Splinter , Bo H Vanderberg
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies Inc.
- Current Assignee: Axcelis Technologies Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J29/51 ; G21K1/08
Abstract:
A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and mass analyzed by a mass analyzer. Ions are implanted into the workpiece in one of a first mode and a second mode based on the desired dosage of ions, where in the first mode, the ion beam is scanned by a beam scanning system positioned downstream of the mass analyzer and parallelized by a parallelizer positioned downstream of the beam scanning system. In the first mode, the workpiece is scanned through the scanned ion beam in at least one dimension by a workpiece scanning system. In the second mode, the ion beam is passed through the beam scanning system and parallelizer un-scanned, and the workpiece is two-dimensionally scanned through the spot ion beam.
Public/Granted literature
- US20090321625A1 Ion Implanter Having Combined Hybrid and Double Mechanical Scan Architecture Public/Granted day:2009-12-31
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