发明授权
- 专利标题: Protective tape cutting method for semiconductor wafer and device of the same
- 专利标题(中): 半导体晶圆的保护带切割方法及其装置
-
申请号: US12276343申请日: 2008-11-23
-
公开(公告)号: US08127647B2公开(公告)日: 2012-03-06
- 发明人: Naoki Ishii , Masayuki Yamamoto
- 申请人: Naoki Ishii , Masayuki Yamamoto
- 申请人地址: JP Osaka
- 专利权人: Nitto Denko Corporation
- 当前专利权人: Nitto Denko Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: Cheng Law Group, PLLC
- 优先权: JP2007-306104 20071127
- 主分类号: B32B38/04
- IPC分类号: B32B38/04
摘要:
A cutter blade is relatively moved along an outer periphery of a semiconductor wafer, and dust generated at a tape cutting site by the cutter blade and attached to an upper surface of the protective tape is collected with a dust collecting member which relatively moves with the cutter blade with respect to the semiconductor wafer, and the dust collected at a predetermined portion is suctioned and removed with a suction nozzle after the completion of tape cutting.
公开/授权文献
信息查询