发明授权
- 专利标题: Method of manufacturing a phase changeable memory unit having an enhanced structure to reduce a reset current
- 专利标题(中): 制造具有增强结构以减少复位电流的相变存储器单元的方法
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申请号: US12592816申请日: 2009-12-03
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公开(公告)号: US08133757B2公开(公告)日: 2012-03-13
- 发明人: Hyun-Suk Kwon , Young-Soo Lim , Sung-Un Kwon , Yong-Ho Ha , Jeong-Hee Park , Joon-Sang Park , Myung-Jin Kang , Doo-Hwan Park
- 申请人: Hyun-Suk Kwon , Young-Soo Lim , Sung-Un Kwon , Yong-Ho Ha , Jeong-Hee Park , Joon-Sang Park , Myung-Jin Kang , Doo-Hwan Park
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Onello & Mello, LLP
- 优先权: KR10-2008-0122316 20081204
- 主分类号: H01L29/02
- IPC分类号: H01L29/02
摘要:
A phase changeable memory unit includes a lower electrode, an insulating interlayer structure having an opening, a phase changeable material layer and an upper electrode. The lower electrode is formed on a substrate. The insulating interlayer structure has an opening and is formed on the lower electrode and the substrate. The opening exposes the lower electrode and has a width gradually decreasing downward. The phase changeable material layer fills the opening and partially covers an upper face of the insulating interlayer structure. The upper electrode is formed on the phase changeable material layer.
公开/授权文献
- US20100144135A1 Method of manufacturing a phase changeable memory unit 公开/授权日:2010-06-10
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