发明授权
- 专利标题: Substrate developing method and developing apparatus
- 专利标题(中): 基板显影方法及显影装置
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申请号: US12032582申请日: 2008-02-15
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公开(公告)号: US08137576B2公开(公告)日: 2012-03-20
- 发明人: Masahiko Harumoto , Akira Yamaguchi , Akihiro Hisai
- 申请人: Masahiko Harumoto , Akira Yamaguchi , Akihiro Hisai
- 申请人地址: JP Kyoto
- 专利权人: Sokudo Co., Ltd.
- 当前专利权人: Sokudo Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: Kilpatrick Townsend & Stockton LLP
- 优先权: JP2007-044042 20070223
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; C23F1/00
摘要:
A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neutralizing the developer and removing the developer from the substrate. In the neutralizing and removing step, the developer is neutralized by the treating solution. This neutralization reaction forms a product (salt) which easily melts into the treating solution and does not precipitate. Thus, the product is removable from the substrate along with the treating solution. Therefore, the developer is inhibited from remaining on the substrate. As a result, it is possible to prevent post-develop defects due to “residues of the developer” or the developer remaining on the substrate.
公开/授权文献
- US20080203058A1 SUBSTRATE DEVELOPING METHOD AND DEVELOPING APPARATUS 公开/授权日:2008-08-28
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