Invention Grant
- Patent Title: Bakeable lithographic printing plates with a high resistance to chemicals
- Patent Title (中): 可烘烤平版印刷版，具有高耐化学性
-
Application No.: US12297058Application Date: 2007-04-12
-
Publication No.: US08137891B2Publication Date: 2012-03-20
- Inventor: Mathias Jarek , Monika Brummer
- Applicant: Mathias Jarek , Monika Brummer
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J Lanny Tucker
- Priority: EP06008510 20060425
- International Application: PCT/EP2007/003271 WO 20070412
- International Announcement: WO2007/121871 WO 20071101
- Main IPC: G03F7/004
- IPC: G03F7/004
Abstract:
A singe- or multilayer lithographic printing plate precursor comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and amide recurring units derived from corresponding ethylenically unsaturated polymerizable monomers; the copolymer provides increased chemical resistance for the lithographic printing plate precursors which can be negatively or positively working.
Public/Granted literature
- US20090269554A1 BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS Public/Granted day:2009-10-29
Information query
IPC分类:
