Invention Grant
- Patent Title: Structure and method for improving photoresist pattern adhesion
- Patent Title (中): 改善光致抗蚀剂图案粘附性的结构和方法
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Application No.: US11427721Application Date: 2006-06-29
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Publication No.: US08137895B2Publication Date: 2012-03-20
- Inventor: Ching-Yu Chang
- Applicant: Ching-Yu Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/11
- IPC: G03F7/11
Abstract:
An anti-reflective coating comprises a plurality of main backbone chains, and at least one long free polymer chain coupled to at least one of the plurality of main backbone chains.
Public/Granted literature
- US20070037089A1 STRUCTURE AND METHOD FOR IMPROVING PHOTORESIST PATTERN ADHESION Public/Granted day:2007-02-15
Information query
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