发明授权
- 专利标题： Method and system for tone inverting of residual layer tolerant imprint lithography
- 专利标题（中）： 残余层容忍压印光刻的色调反转方法和系统
-
申请号： US12787429申请日： 2010-05-26
-
公开(公告)号： US08137997B2公开(公告)日： 2012-03-20
- 发明人: Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
- 申请人： Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
- 申请人地址： US NY Armonk
- 专利权人： International Business Machine Corporation
- 当前专利权人： International Business Machine Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： McGinn Intellectual Property Law Group, PLLC
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A system for imprint lithography, which includes a substrate, a patterned mask, an imprint applying unit that imprints, via the patterned mask, a pattern into a resist layer on the substrate, and an overlay device that overlays a cladding layer over the substrate.
公开/授权文献
信息查询
IPC分类:
