发明授权
- 专利标题: Formation of carbon and semiconductor nanomaterials using molecular assemblies
- 专利标题(中): 使用分子组装形成碳和半导体纳米材料
-
申请号: US12973063申请日: 2010-12-20
-
公开(公告)号: US08138492B2公开(公告)日: 2012-03-20
- 发明人: Ali Afzali-Ardakani , Cherie R. Kagan , Laura L. Kosbar
- 申请人: Ali Afzali-Ardakani , Cherie R. Kagan , Laura L. Kosbar
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Connolly Bove Lodge & Hutz LLP
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L21/28
摘要:
The invention is directed to a method of forming carbon nanomaterials or semiconductor nanomaterials. The method comprises providing a substrate and attaching a molecular precursor to the substrate. The molecular precursor includes a surface binding group for attachment to the substrate and a binding group for attachment of metal-containing species. The metal-containing species is selected from a metal cation, metal compound, or metal or metal-oxide nanoparticle to form a metallized molecular precursor. The metallized molecular precursor is then subjected to a heat treatment to provide a catalytic site from which the carbon nanomaterials or semiconductor nanomaterials form. The heating of the metallized molecular precursor is conducted under conditions suitable for chemical vapor deposition of the carbon nanomaterials or semiconductor nanomaterials.