发明授权
- 专利标题: Laser system
- 专利标题(中): 激光系统
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申请号: US12639339申请日: 2009-12-16
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公开(公告)号: US08144740B1公开(公告)日: 2012-03-27
- 发明人: Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
- 申请人: Daniel J. W. Brown , William N. Partlo , Richard L. Sandstrom
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 代理机构: DiBerardino Law LLC
- 主分类号: H01S3/13
- IPC分类号: H01S3/13
摘要:
An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½X kHz on output pulses from the second seed laser.
公开/授权文献
- US20120087386A1 LASER SYSTEM 公开/授权日:2012-04-12