Invention Grant
- Patent Title: Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system
- Patent Title (中): 用于表征磁性增强的衬底处理系统中的磁场的装置
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Application No.: US12360664Application Date: 2009-01-27
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Publication No.: US08148977B2Publication Date: 2012-04-03
- Inventor: Kartik Ramaswamy , Hiroji Hanawa , Lawrence Wong , Chinh Dinh
- Applicant: Kartik Ramaswamy , Hiroji Hanawa , Lawrence Wong , Chinh Dinh
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: G01R33/02
- IPC: G01R33/02

Abstract:
Embodiments of sensor devices for characterizing magnetic fields formed in substrate processing systems and methods of use thereof are provided herein. In some embodiments, an apparatus for characterizing a magnetic field in a substrate processing system may include a carrier having a form substantially similar to a substrate to be processed in the substrate processing system. One or more magnetic sensors are disposed on the carrier for measuring a magnitude of a magnetic field formed in the processing system in an x-, y-, and z-direction. A microprocessor is coupled to the one or more magnetic sensors to sample data representative of the magnitude of the magnetic field in the x-, y-, and z-directions proximate a position of each sensor. A memory device is coupled to the microprocessor for storing the sampled data. A power source is provided to supply power to each magnetic sensor and the microprocessor.
Public/Granted literature
- US20100188077A1 APPARATUS FOR CHARACTERIZING A MAGNETIC FIELD IN A MAGNETICALLY ENHANCED SUBSTRATE PROCESSING SYSTEM Public/Granted day:2010-07-29
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