发明授权
- 专利标题: Patterned medium and method of manufacturing the same
- 专利标题(中): 图案化介质及其制造方法
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申请号: US12713022申请日: 2010-02-25
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公开(公告)号: US08153205B2公开(公告)日: 2012-04-10
- 发明人: Akira Kikitsu , Yoshiyuki Kamata , Masatoshi Sakurai
- 申请人: Akira Kikitsu , Yoshiyuki Kamata , Masatoshi Sakurai
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Knobbe, Martens, Olson & Bear LLP
- 优先权: JP2009-044002 20090226
- 主分类号: C08F2/48
- IPC分类号: C08F2/48
摘要:
According to one embodiment, a method of manufacturing a patterned medium includes depositing a magnetic recording layer and applying an ultraviolet curable resin on both surfaces of a medium substrate, pressing a first resin stamper and a second resin stamper each including patterns of recesses and protrusions, corresponding to a patterned medium, against both surfaces of the medium substrate in such a manner that a direction from a center of the medium substrate toward a center of the first resin stamper is off-oriented from a direction from the center of the medium substrate toward a center of the second resin stamper to imprint the patterns of recesses and protrusions on the ultraviolet curable resin, and irradiating the ultraviolet curable resin with an ultraviolet ray through each of the first and second resin stampers to cure the ultraviolet curable resin.
公开/授权文献
- US20100215990A1 PATTERNED MEDIUM AND METHOD OF MANUFACTURING THE SAME 公开/授权日:2010-08-26
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