发明授权
US08153351B2 Methods for performing photolithography using BARCs having graded optical properties
有权
使用具有渐变光学特性的BARC进行光刻的方法
- 专利标题： Methods for performing photolithography using BARCs having graded optical properties
- 专利标题（中）： 使用具有渐变光学特性的BARC进行光刻的方法
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申请号： US12255514申请日： 2008-10-21
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公开(公告)号： US08153351B2公开(公告)日： 2012-04-10
- 发明人: Thomas I. Wallow , Jongwook Kye
- 申请人： Thomas I. Wallow , Jongwook Kye
- 申请人地址： US TX Austin
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US TX Austin
- 代理机构： Ingrassia Fisher & Lorenz, P.C.
- 主分类号： G03F7/09
- IPC分类号： G03F7/09 ; G03F7/11
摘要：
Photolithography methods using BARCs having graded optical properties are provided. In an exemplary embodiment, a photolithography method comprises the steps of depositing a BARC overlying a material to be patterned, the BARC having a refractive index and an absorbance. The BARC is modified such that, after the step of modifying, values of the refractive index and the absorbance are graded from first values at a first surface of the BARC to second values at a second surface of the BARC. The step of modifying is performed after the step of depositing.