发明授权
- 专利标题: Positive-type photosensitive resin composition
- 专利标题(中): 正型感光性树脂组合物
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申请号: US12449527申请日: 2008-02-05
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公开(公告)号: US08158324B2公开(公告)日: 2012-04-17
- 发明人: Yoji Fujita , Shinji Arimoto , Rinsei Ike
- 申请人: Yoji Fujita , Shinji Arimoto , Rinsei Ike
- 申请人地址: JP Tokyo
- 专利权人: TORAY Industries, Inc.
- 当前专利权人: TORAY Industries, Inc.
- 当前专利权人地址: JP Tokyo
- 代理机构: Kubovcik & Kubovcik
- 优先权: JP2007-31710 20070213; JP2007-61542 20070312
- 国际申请: PCT/JP2008/051799 WO 20080205
- 国际公布: WO2008/099709 WO 20080821
- 主分类号: G03F7/023
- IPC分类号: G03F7/023
摘要:
A positive-type photosensitive resin composition, including: (a) a novolac resin; (b) a polymer including, as a main component, a structure represented by formula (1) and/or formula (2): (wherein R1 and R2 may be the same or different and each represent an organic group having at least two carbon atoms and a valence of 2 to 8, R3 and R4 may be the same or different and each represent hydrogen or a monovalent organic group of 1 to 20 carbon atoms, —NH—R5 in formula (1) and —CO—R6 in formula (2) each represent a polymer end group, R5 and R6 each represent a monovalent organic group having 2 to 30 carbon atoms which includes an unsaturated hydrocarbon group, n is in the range of 10 to 100,000, l and m each represent an integer of 0 to 2, and p and q each represent an integer of 0 to 4, provided that p+q>0; (c) a quinone diazide compound; (d) an alkoxymethyl group-containing compound; and (e) a solvent.
公开/授权文献
- US20100099041A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 公开/授权日:2010-04-22
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