发明授权
- 专利标题: Charged particle beam application apparatus
- 专利标题(中): 带电粒子束施加装置
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申请号: US12828781申请日: 2010-07-01
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公开(公告)号: US08158955B2公开(公告)日: 2012-04-17
- 发明人: Masaki Mizuochi , Shoji Tomida
- 申请人: Masaki Mizuochi , Shoji Tomida
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2007-156357 20070613
- 主分类号: H02N13/00
- IPC分类号: H02N13/00
摘要:
An apparatus capable of improving image quality by making it possible to suck specimens of different sizes electrostatically, and uniformalizing an electric field of a specimen edge portion, while suppressing increase in prime cost is provided. Specimen holding means is an electrostatic chuck, a master flat plane part surrounding a specimen of the largest size of specimen sizes, and an opening surrounding a specimen size except for the largest specimen size are included at an outer peripheral portion of the electrostatic chuck, a dummy specimen attachable to and detachable from the electrostatic chuck is included, and at a time of switching the specimen size, a dummy specimen is selected (or may be prevented from being used).
公开/授权文献
- US20100264330A1 CHARGED PARTICLE BEAM APPLICATION APPARATUS 公开/授权日:2010-10-21