Invention Grant
- Patent Title: Graded junction high voltage semiconductor device
- Patent Title (中): 分级结高压半导体器件
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Application No.: US11490407Application Date: 2006-07-19
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Publication No.: US08159001B2Publication Date: 2012-04-17
- Inventor: Bin Wang
- Applicant: Bin Wang
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Fenwick & West LLP
- Main IPC: H01L29/72
- IPC: H01L29/72

Abstract:
A graded junction space decreasing an implant concentration gradient between n-well and p-well regions of a semiconductor device is provided for enhancing breakdown voltage in high voltage applications. Split or unified FOX regions may be provided overlapping with the graded junction space. By using a p-well blocking layer to separate the p-well(s) and the n-well, breakdown voltage characteristic is improved without the cost of an additional mask or process change.
Public/Granted literature
- US20070093028A1 Graded junction high voltage semiconductor device Public/Granted day:2007-04-26
Information query
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