Invention Grant
- Patent Title: Semiconductor laser and method for manufacturing the same
- Patent Title (中): 半导体激光器及其制造方法
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Application No.: US12667763Application Date: 2008-06-09
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Publication No.: US08160116B2Publication Date: 2012-04-17
- Inventor: Tomoyuki Akiyama , Mitsuru Sugawara
- Applicant: Tomoyuki Akiyama , Mitsuru Sugawara
- Applicant Address: JP Tokyo
- Assignee: QD Laser Inc.
- Current Assignee: QD Laser Inc.
- Current Assignee Address: JP Tokyo
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2007-186352 20070717
- International Application: PCT/JP2008/060517 WO 20080609
- International Announcement: WO2009/011184 WO 20090122
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
The present invention provides a semiconductor laser including a first conductive type of a lower clad layer 12, an active layer 14 provided on the lower clad layer 12, the active layer 14 including a plurality of quantum dots, and a second conductive type of an upper clad layer 18, the upper clad layer 18 being provided on the active layer 14 so as to have an isolated ridge portion 30 such that W1≦Wtop+0.4 μm where Wtop is the width of a top of the ridge portion 30 and W1 is the width of the ridge portion 30 at a height of 50 nm from a bottom of the ridge portion 30. The present invention also provides a method for manufacturing such a semiconductor laser.
Public/Granted literature
- US20100195688A1 SEMICONDUCTOR LASER AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2010-08-05
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