发明授权
- 专利标题： Nanostructure and manufacturing method for same
- 专利标题（中）： 纳米结构及其制造方法相同
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申请号： US11938541申请日： 2007-11-12
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公开(公告)号： US08163084B2公开(公告)日： 2012-04-24
- 发明人: Yoshihiro Terada , Mitsuru Kamikatano , Kuniharu Himeno , Bunsho Ohtani , Takamune Yamagami , Tsukasa Torimoto
- 申请人： Yoshihiro Terada , Mitsuru Kamikatano , Kuniharu Himeno , Bunsho Ohtani , Takamune Yamagami , Tsukasa Torimoto
- 申请人地址： JP Tokyo JP Hokkaido
- 专利权人： Fujikura Ltd.,National University Corporation Hokkaido University
- 当前专利权人： Fujikura Ltd.,National University Corporation Hokkaido University
- 当前专利权人地址： JP Tokyo JP Hokkaido
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2004-343117 20041126
- 主分类号： C30B29/60
- IPC分类号： C30B29/60
摘要：
The invention relates to nanostructure and its manufacturing method. In the manufacturing method of a nanostructure, first anisotropic crystalline particles, connectors having end to be connected to a specific crystal face of each of said crystalline particles, and second particles to be connected to the other end of each of said connectors are prepared. First ends of the connectors are connected to specific crystal faces of the first crystalline particles, and simultaneously or before or after the connection, the second ends of the connectors are connected to the second particles. A nanostructure formed by this method has a three-dimensional structure which does not have a closest packing structure.
公开/授权文献
- US20080075889A1 NANOSTRUCTURE AND MANUFACTURING METHOD FOR SAME 公开/授权日：2008-03-27