发明授权
US08163463B2 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
有权
光刻胶组合物,使用光致抗蚀剂组合物和喷墨打印头形成图案的方法
- 专利标题: Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
- 专利标题(中): 光刻胶组合物,使用光致抗蚀剂组合物和喷墨打印头形成图案的方法
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申请号: US12040009申请日: 2008-02-29
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公开(公告)号: US08163463B2公开(公告)日: 2012-04-24
- 发明人: Jin-baek Kim , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
- 申请人: Jin-baek Kim , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Stanzione & Kim, LLP
- 优先权: KR10-2007-0079170 20070807
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/20 ; G03F7/30 ; B41J2/05 ; B41J2/16
摘要:
A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
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