发明授权
US08163463B2 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head 有权
光刻胶组合物,使用光致抗蚀剂组合物和喷墨打印头形成图案的方法

Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
摘要:
A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
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