Invention Grant
- Patent Title: System and method for a charged particle beam
- Patent Title (中): 带电粒子束的系统和方法
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Application No.: US12832127Application Date: 2010-07-08
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Publication No.: US08164060B2Publication Date: 2012-04-24
- Inventor: Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
- Applicant: Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
- Applicant Address: CN Taiwan
- Assignee: Hermes-Microvision, Inc.
- Current Assignee: Hermes-Microvision, Inc.
- Current Assignee Address: CN Taiwan
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01J37/244
- IPC: H01J37/244 ; H01J37/145

Abstract:
System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
Public/Granted literature
- US20100270468A1 SYSTEM AND METHOD FOR A CHARGED PARTICLE BEAM Public/Granted day:2010-10-28
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