发明授权
- 专利标题： Extreme ultraviolet light source apparatus and method of generating extreme ultraviolet light
- 专利标题（中）： 极紫外光源装置和产生极紫外光的方法
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申请号： US12569194申请日： 2009-09-29
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公开(公告)号： US08164076B2公开(公告)日： 2012-04-24
- 发明人: Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
- 申请人： Akira Endo , Yoshifumi Ueno , Youichi Sasaki , Osamu Wakabayashi
- 申请人地址： JP Tochigi
- 专利权人： Gigaphoton Inc.
- 当前专利权人： Gigaphoton Inc.
- 当前专利权人地址： JP Tochigi
- 代理机构： McDermott Will & Emery LLP
- 优先权： JP2008-250744 20080929; JP2009-212884 20090915
- 主分类号： H05G2/00
- IPC分类号： H05G2/00
摘要：
An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.