发明授权
- 专利标题: Simulation apparatus for a semiconductor device
- 专利标题(中): 半导体器件的仿真装置
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申请号: US12563517申请日: 2009-09-21
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公开(公告)号: US08165852B2公开(公告)日: 2012-04-24
- 发明人: Toshiyuki Enda
- 申请人: Toshiyuki Enda
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2008-334637 20081226
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A simulation apparatus of semiconductor device includes a first calculator, a second calculator, a third calculator, a fourth calculator, and a controller. The first calculator applies a voltage to an area which functions as a virtual electrode, and setting a pseudo-Fermi level of a first carrier in the area functioning as the virtual electrode to calculate a first carrier density. The second calculator analyzes continuous equation of a second carrier to calculate a second carrier density. The third calculator uses the first carrier density as a function of an electrostatic potential, and solving a first equation of the function and a Poisson's equation to calculate an electrostatic potential and the first carrier density expressed by the function. The fourth calculator calculates a current density of the first carrier to calculate a current flowing. The controller controls the voltage applied to the virtual electrode.
公开/授权文献
- US20100169061A1 SIMULATION APPARATUS FOR A SEMICONDUCTOR DEVICE 公开/授权日:2010-07-01
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