Invention Grant
- Patent Title: Simulation apparatus for a semiconductor device
- Patent Title (中): 半导体器件的仿真装置
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Application No.: US12563517Application Date: 2009-09-21
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Publication No.: US08165852B2Publication Date: 2012-04-24
- Inventor: Toshiyuki Enda
- Applicant: Toshiyuki Enda
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-334637 20081226
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A simulation apparatus of semiconductor device includes a first calculator, a second calculator, a third calculator, a fourth calculator, and a controller. The first calculator applies a voltage to an area which functions as a virtual electrode, and setting a pseudo-Fermi level of a first carrier in the area functioning as the virtual electrode to calculate a first carrier density. The second calculator analyzes continuous equation of a second carrier to calculate a second carrier density. The third calculator uses the first carrier density as a function of an electrostatic potential, and solving a first equation of the function and a Poisson's equation to calculate an electrostatic potential and the first carrier density expressed by the function. The fourth calculator calculates a current density of the first carrier to calculate a current flowing. The controller controls the voltage applied to the virtual electrode.
Public/Granted literature
- US20100169061A1 SIMULATION APPARATUS FOR A SEMICONDUCTOR DEVICE Public/Granted day:2010-07-01
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