Invention Grant
- Patent Title: Method for manufacturing semiconductor light-emitting device
- Patent Title (中): 半导体发光元件的制造方法
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Application No.: US13009071Application Date: 2011-01-19
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Publication No.: US08168459B2Publication Date: 2012-05-01
- Inventor: Sho Iwayama , Takanobu Akagi
- Applicant: Sho Iwayama , Takanobu Akagi
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2010-011031 20100121
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A method for manufacturing a resin-embedded semiconductor light-emitting device that is capable of preventing a semiconductor film from being damaged when a growth substrate is delaminated using a laser lift-off method, and that is capable of preventing foreign matter from adhering to the semiconductor film when a resin material is applied. A laser exposure step to delaminate the growth substrate from the semiconductor film comprises a first laser exposure step for performing laser exposure at an energy density at which the resin is broken down but the semiconductor film is not broken down, in a range including a portion adjacent to at least one section of the semiconductor film divided by dividing grooves and at least one section of resin, and a second exposure step for performing laser exposure at an energy density at which the semiconductor film can be broken down in a range including at least one section.
Public/Granted literature
- US20110177633A1 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING DEVICE Public/Granted day:2011-07-21
Information query
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