Invention Grant
US08168517B2 Method for epitaxial growth and epitaxial layer structure using the method
有权
使用该方法外延生长和外延层结构的方法
- Patent Title: Method for epitaxial growth and epitaxial layer structure using the method
- Patent Title (中): 使用该方法外延生长和外延层结构的方法
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Application No.: US12388643Application Date: 2009-02-19
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Publication No.: US08168517B2Publication Date: 2012-05-01
- Inventor: Jae-eung Oh
- Applicant: Jae-eung Oh
- Applicant Address: KR Seoul
- Assignee: Industry-University Cooperation Foundation Hanyang University
- Current Assignee: Industry-University Cooperation Foundation Hanyang University
- Current Assignee Address: KR Seoul
- Agency: Kile Park Goekijian Reed & McManus PLLC
- Priority: KR10-2009-0007042 20090129
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/36

Abstract:
There are provided a method for epitaxial growth capable of securing stable optical and electrical characteristics by minimizing defects produced in a second epitaxial layer when growing the second epitaxial layer on a first epitaxial layer having defects formed therein, and an epitaxial layer structure using the method. The method includes preparing a first epitaxial layer having a defect formed therein, forming a metal quantum dot on the first epitaxial layer, allowing the metal quantum dot to be moved onto a step of the first epitaxial layer due to a difference of surface energy, converting the metal quantum dot into a metal quantum-dot semiconductor crystal having a lattice constant corresponding to that of the first epitaxial layer, and growing a second epitaxial layer on the first epitaxial layer.
Public/Granted literature
- US20100187499A1 METHOD FOR EPITAXIAL GROWTH AND EPITAXIAL LAYER STRUCTURE USING THE METHOD Public/Granted day:2010-07-29
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