Invention Grant
- Patent Title: High-stability thin-film capacitor and method for making the same
- Patent Title (中): 高稳定性薄膜电容器及其制造方法
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Application No.: US12311529Application Date: 2007-10-16
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Publication No.: US08169771B2Publication Date: 2012-05-01
- Inventor: Emmanuel Defay , Julie Guillan , Serge Blonkowski
- Applicant: Emmanuel Defay , Julie Guillan , Serge Blonkowski
- Applicant Address: FR Paris FR Crolles
- Assignee: Commissariat a l'Energie Atomique,STMicroelectronics (Crolles 2) S.A.S.
- Current Assignee: Commissariat a l'Energie Atomique,STMicroelectronics (Crolles 2) S.A.S.
- Current Assignee Address: FR Paris FR Crolles
- Agency: Oliff & Berridge, PLC
- Priority: FR0609177 20061019
- International Application: PCT/FR2007/001701 WO 20071016
- International Announcement: WO2008/047000 WO 20080424
- Main IPC: H01G4/06
- IPC: H01G4/06 ; H01G4/10

Abstract:
The dielectric of a capacitor is formed by superposition of at least two thin layers made from the same metal oxide, respectively in crystalline and amorphous form and respectively presenting quadratic voltage coefficients of capacitance of opposite signs. The respective thicknesses da and dc of the amorphous and crystalline thin layers comply with the following general formulas: d a = ɛ 0 ɛ a C s 0 ( 1 1 - ( ɛ c ɛ a ) 2 γ a γ c ) and d c = ɛ 0 ɛ c C s 0 ( 1 1 - ( ɛ a ɛ c ) 2 γ c γ a ) in which ∈0 corresponds to the electric constant, ∈c and ∈a correspond to the relative permittivity of the metal oxide respectively in crystalline form and in amorphous form, Cs0 corresponds to the total surface capacitance at zero field, and γc and γa correspond to the quadratic coefficient of capacitance with respect to the electric field of the metal oxide respectively in crystalline form and in amorphous form.
Public/Granted literature
- US20100002358A1 HIGH-STABILITY THIN-FILM CAPACITOR AND METHOD FOR MAKING THE SAME Public/Granted day:2010-01-07
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