发明授权
- 专利标题: Method for detecting surface defects in patterned media
- 专利标题(中): 用于检测图案化介质中表面缺陷的方法
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申请号: US12715891申请日: 2010-03-02
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公开(公告)号: US08169868B2公开(公告)日: 2012-05-01
- 发明人: Ayumu Ishihara
- 申请人: Ayumu Ishihara
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Brundidge & Stanger, P.C.
- 优先权: JP2009-076230 20090326
- 主分类号: G11B20/18
- IPC分类号: G11B20/18
摘要:
An optical defect detection method for patterned media includes: irradiating a laser beam onto a patterned medium and obtaining reflected light by reflection very close to a sample; outputting the reflected light as an analog electrical signal from an optical receiver; converting the analog signal to a digital signal; obtaining a surface profile in a track direction by sampling the analog signal; obtaining a servo area profile by setting a slice for detecting servo area; calculating an average value in a track width direction based on plural servo area profiles; generating a master servo area profile based on the average value; obtaining a difference between the master servo area profile and the specific servo area profile; and detecting the presence of a defect including surface roughness, process fluctuation, and adhesion of foreign matters, from a differential waveform.
公开/授权文献
- US20100246357A1 METHOD FOR DETECTING SURFACE DEFECTS IN PATTERNED MEDIA 公开/授权日:2010-09-30