发明授权
- 专利标题: Laser annealing method and apparatus
- 专利标题(中): 激光退火方法和装置
-
申请号: US12811818申请日: 2008-05-30
-
公开(公告)号: US08170072B2公开(公告)日: 2012-05-01
- 发明人: Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Miyuki Masaki , Masaru Morita
- 申请人: Norihito Kawaguchi , Ryusuke Kawakami , Kenichiro Nishida , Miyuki Masaki , Masaru Morita
- 申请人地址: JP Tokyo
- 专利权人: IHI Corporation
- 当前专利权人: IHI Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Griffin & Szipl, P.C.
- 优先权: JP2008-000347 20080107
- 国际申请: PCT/JP2008/060044 WO 20080530
- 国际公布: WO2009/087784 WO 20090716
- 主分类号: H01S3/10
- IPC分类号: H01S3/10
摘要:
In the case of a lens array type homogenizer optical system, the incident angle and intensity of a laser beam 1 entering a large-sized lens (long-axis condenser lens 22) of a long-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while long-axis lens arrays 20a and 20b are reciprocated in a direction corresponding to a long axial direction of a linear beam (X-direction). Therefore, vertical stripes are significantly reduced. Further, the incident angle and intensity of a laser beam 1 entering a large-sized lens (projection lens 30) of a short-axis condensing optical system, which is provided on the rear side, are changed for every shot by performing laser irradiation while short-axis lens arrays 26a and 26b are reciprocated in a direction corresponding to a short axial direction of a linear beam (Y-direction). Therefore, horizontal stripes are significantly reduced.
公开/授权文献
- US20110008973A1 LASER ANNEALING METHOD AND APPARATUS 公开/授权日:2011-01-13
信息查询