发明授权
US08173475B2 Method of producing photoelectric conversion device having a multilayer structure formed on a substrate 有权
一种制造具有形成在基板上的多层结构的光电转换装置的方法

  • 专利标题: Method of producing photoelectric conversion device having a multilayer structure formed on a substrate
  • 专利标题(中): 一种制造具有形成在基板上的多层结构的光电转换装置的方法
  • 申请号: US13011584
    申请日: 2011-01-21
  • 公开(公告)号: US08173475B2
    公开(公告)日: 2012-05-08
  • 发明人: Tetsuo KawanoTakashi Koike
  • 申请人: Tetsuo KawanoTakashi Koike
  • 申请人地址: JP Tokyo
  • 专利权人: FUJIFILM Corporation
  • 当前专利权人: FUJIFILM Corporation
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Sughrue Mion, PLLC
  • 优先权: JP2010-017657 20100129
  • 主分类号: H01L21/00
  • IPC分类号: H01L21/00
Method of producing photoelectric conversion device having a multilayer structure formed on a substrate
摘要:
A method of producing a photoelectric conversion device having a multilayer structure formed on a substrate, the multilayer structure including a lower electrode, a photoelectric conversion layer made of a compound semiconductor layer, an n-type buffer layer made of a compound semiconductor layer, and a transparent conductive layer, is disclosed. A reaction solution, which is an aqueous solution containing an n-type dopant element, at least one of ammonia and an ammonium salt, and thiourea, is prepared, the n-type dopant is diffused into the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer in the reaction solution controlled to a temperature in the range from 20° C. to 45° C.; and the buffer layer is deposited on the photoelectric conversion layer by immersing the substrate including the photoelectric conversion layer subjected to the diffusion step in the reaction solution controlled to a temperature in the range from 70° C. to 95° C.
公开/授权文献
信息查询
0/0