发明授权
US08173573B2 Visible light response-type photocatalyst powder, visible light response-type photocatalyst material using the visible light response-type photocatalyst powder, photocatalyst coating material, and photocatalyst product
有权
可见光反应型光催化剂粉末,可见光反应型光催化剂材料,采用可见光反应型光催化剂粉末,光催化剂涂料和光催化剂产品
- 专利标题: Visible light response-type photocatalyst powder, visible light response-type photocatalyst material using the visible light response-type photocatalyst powder, photocatalyst coating material, and photocatalyst product
- 专利标题(中): 可见光反应型光催化剂粉末,可见光反应型光催化剂材料,采用可见光反应型光催化剂粉末,光催化剂涂料和光催化剂产品
-
申请号: US12844453申请日: 2010-07-27
-
公开(公告)号: US08173573B2公开(公告)日: 2012-05-08
- 发明人: Kayo Nakano , Akira Sato , Yasuhiro Shirakawa , Keiichi Fuse , Masami Okamura , Shinya Kasamatsu , Yumi Ito
- 申请人: Kayo Nakano , Akira Sato , Yasuhiro Shirakawa , Keiichi Fuse , Masami Okamura , Shinya Kasamatsu , Yumi Ito
- 申请人地址: JP Tokyo JP Yokohama-shi
- 专利权人: Kabushiki Kaisha Toshiba,Toshiba Materials Co., Ltd.
- 当前专利权人: Kabushiki Kaisha Toshiba,Toshiba Materials Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Yokohama-shi
- 代理机构: Foley & Lardner LLP
- 优先权: JP2008-016649 20080128; JP2008-016650 20080128; JP2008-016651 20080128; JP2008-054142 20080304
- 主分类号: B01J23/00
- IPC分类号: B01J23/00
摘要:
In one embodiment, a visible light responsive photocatalyst powder has organic gas decomposition performance that responds nonlinearly to an amount of irradiated light under visible light in an illuminance range of not less than 200 lx nor more than 2500 lx. The visible light responsive photocatalyst powder has a gas decomposition rate of 20% or more, for example, when visible light having only a wavelength of not less than 380 nm and an illuminance of 2500 lx is irradiated, the gas decomposition rate (%) being set as a value calculated based on [formula: (A−B)/A×100], where A represents a gas concentration before light irradiation and B represents a gas concentration when not less than 15 minutes have elapsed from the light irradiation and, at the same time, the gas concentration is stable, the gas concentrations being measured while allowing an acetaldehyde gas having an initial concentration of 10 ppm to flow into a flow-type apparatus in which 0.2 g of a sample is placed.
公开/授权文献
信息查询