发明授权
- 专利标题: Non-volatile semiconductor storage device
- 专利标题(中): 非易失性半导体存储装置
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申请号: US12721001申请日: 2010-03-10
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公开(公告)号: US08174890B2公开(公告)日: 2012-05-08
- 发明人: Takashi Maeda , Tsuneo Inaba
- 申请人: Takashi Maeda , Tsuneo Inaba
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-058538 20090311
- 主分类号: G11C11/34
- IPC分类号: G11C11/34 ; G11C16/04
摘要:
A memory cell array has plural memory strings arranged therein, each of which including a plurality of electrically-rewritable memory transistors and selection transistors. Each memory string includes a body semiconductor layer including four or more columnar portions, and a joining portion formed to join the lower ends thereof. An electric charge storage layer is formed to surround a side surface of the columnar portions. A first conductive layer is formed to surround a side surface of the columnar portions as well as the electric charge storage layer. A plurality of second conductive layers are formed on side surfaces of the joining portion via an insulation film, and function as control electrodes of a plurality of back-gate transistors formed at a respective one of the joining portions.
公开/授权文献
- US20100232224A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE 公开/授权日:2010-09-16
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