Invention Grant
- Patent Title: Non-volatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储装置
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Application No.: US12721001Application Date: 2010-03-10
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Publication No.: US08174890B2Publication Date: 2012-05-08
- Inventor: Takashi Maeda , Tsuneo Inaba
- Applicant: Takashi Maeda , Tsuneo Inaba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-058538 20090311
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C16/04

Abstract:
A memory cell array has plural memory strings arranged therein, each of which including a plurality of electrically-rewritable memory transistors and selection transistors. Each memory string includes a body semiconductor layer including four or more columnar portions, and a joining portion formed to join the lower ends thereof. An electric charge storage layer is formed to surround a side surface of the columnar portions. A first conductive layer is formed to surround a side surface of the columnar portions as well as the electric charge storage layer. A plurality of second conductive layers are formed on side surfaces of the joining portion via an insulation film, and function as control electrodes of a plurality of back-gate transistors formed at a respective one of the joining portions.
Public/Granted literature
- US20100232224A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2010-09-16
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