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US08178262B2 Method for fabricating color filter layer 有权
彩色滤光片的制作方法

Method for fabricating color filter layer
Abstract:
A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black matrix thereon, wherein the black matrix defines a plurality of pixel regions. A plurality of color filter patterns is formed in the pixel regions.
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