发明授权
- 专利标题: Bond pad structure
- 专利标题(中): 焊盘结构
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申请号: US12026312申请日: 2008-02-05
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公开(公告)号: US08178980B2公开(公告)日: 2012-05-15
- 发明人: Shin-Puu Jeng , Yu-Wen Liu , Hao-Yi Tsai , Hsien-Wei Chen
- 申请人: Shin-Puu Jeng , Yu-Wen Liu , Hao-Yi Tsai , Hsien-Wei Chen
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L29/40
- IPC分类号: H01L29/40
摘要:
A bonding pad structure is provided that includes two conductive layers and a connective layer interposing the two conductive layers. The connective layer includes a contiguous, conductive structure. In an embodiment, the contiguous conductive structure is a solid layer of conductive material. In other embodiments, the contiguous conductive structure is a conductive network including, for example, a matrix configuration or a plurality of conductive stripes. At least one dielectric spacer may interpose the conductive network. In an embodiment, the conductive density of the connective layer is between approximately 20% and 100%.
公开/授权文献
- US20090194889A1 BOND PAD STRUCTURE 公开/授权日:2009-08-06
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