Invention Grant
- Patent Title: Exhaust gas treatment device
- Patent Title (中): 废气处理装置
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Application No.: US13017882Application Date: 2011-01-31
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Publication No.: US08182752B2Publication Date: 2012-05-22
- Inventor: John D. Ten Eyck , Amit Kumar
- Applicant: John D. Ten Eyck , Amit Kumar
- Applicant Address: US NY Niagara Falls
- Assignee: Unifrax I LLC
- Current Assignee: Unifrax I LLC
- Current Assignee Address: US NY Niagara Falls
- Agency: Curatolo Sidoti Co., LPA
- Agent Joseph G. Curatolo; Vincent A. Cortese
- Main IPC: B01D50/00
- IPC: B01D50/00

Abstract:
A device for treatment of exhaust gases includes a housing, a fragile structure resiliently mounted within the housing, and a non-intumescent mounting mat disposed in a gap between the housing and the fragile structure. The mounting mat includes a plurality of inorganic fibers that have undergone a surface treatment to increase the holding force performance of the mounting mat. Also disclosed are methods of making a mounting mat for an exhaust gas treatment device and for making an exhaust gas treatment device incorporating the mounting mat.
Public/Granted literature
- US20110123417A1 EXHAUST GAS TREATMENT DEVICE Public/Granted day:2011-05-26
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