发明授权
- 专利标题： Glass flux assisted sintering of chemical solution deposited thin dielectric films
- 专利标题（中）： 玻璃助熔烧结化学溶液沉积的薄介电膜
-
申请号： US12301791申请日： 2006-06-15
-
公开(公告)号： US08183108B2公开(公告)日： 2012-05-22
- 发明人: William J. Borland , Seigi Suh , Jon-Paul Maria , Jon Fredrick Ihlefeld , Ian Burn
- 申请人： William J. Borland , Seigi Suh , Jon-Paul Maria , Jon Fredrick Ihlefeld , Ian Burn
- 申请人地址： US DE Wilmington
- 专利权人： CDA Processing Limited Liability Company
- 当前专利权人： CDA Processing Limited Liability Company
- 当前专利权人地址： US DE Wilmington
- 国际申请： PCT/US2006/023457 WO 20060615
- 国际公布： WO2007/145630 WO 20071221
- 主分类号： H01L21/20
- IPC分类号： H01L21/20 ; H01B3/20 ; H01B3/00
摘要：
A method of making dense dielectrics layers via chemical solution deposition by adding inorganic glass fluxed material to high dielectric constant compositions, depositing the resultant mixture onto a substrate and annealing the substrate at temperatures between the softening point of the inorganic glass flux and the melting point of the substrate. A method of making a capacitor comprising a dense dielectric layer.
公开/授权文献
信息查询
IPC分类:
