Invention Grant
- Patent Title: Resistor device and method for manufacturing same
- Patent Title (中): 电阻器件及其制造方法
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Application No.: US12779656Application Date: 2010-05-13
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Publication No.: US08183976B2Publication Date: 2012-05-22
- Inventor: Ta-Wen Lo , Wen-Hsiung Liao , Wu-Liang Chu , Yen-Ting Lin
- Applicant: Ta-Wen Lo , Wen-Hsiung Liao , Wu-Liang Chu , Yen-Ting Lin
- Applicant Address: TW Hsinchu
- Assignee: Cyntec Co., Ltd.
- Current Assignee: Cyntec Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Kirton McConkie
- Agent Evan R. Witt
- Priority: TW98131424A 20090917
- Main IPC: H01C1/012
- IPC: H01C1/012

Abstract:
A resistor device includes a resistor plate having a first aperture, a second aperture, a third aperture and a fourth aperture respectively arranged on a first side, a second side, a third side and a fourth side thereof. A first electrode plate is coupled to the first side of the resistor plate and includes a first measurement zone and a second measurement zone disposed at opposite sides of the first aperture; and a second electrode plate is coupled to the third side of the resistor plate and including a third measurement zone and a fourth measurement zone disposed at opposite sides of the third aperture, wherein the first measurement zone and the third measurement zone are disposed at opposite sides of the second aperture, and the second measurement zone and the fourth measurement zone are disposed at opposite sides of the fourth aperture.
Public/Granted literature
- US20110063072A1 RESISTOR DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2011-03-17
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