Invention Grant
- Patent Title: Method for manufacturing substrate by imprinting
- Patent Title (中): 通过压印制造基板的方法
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Application No.: US11713608Application Date: 2007-03-05
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Publication No.: US08187518B2Publication Date: 2012-05-29
- Inventor: Choon-Keun Lee , Myeong-Ho Hong , Seung-Heon Han , Senug-Hyun Ra
- Applicant: Choon-Keun Lee , Myeong-Ho Hong , Seung-Heon Han , Senug-Hyun Ra
- Applicant Address: KR Suwon
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon
- Priority: KR10-2006-0020853 20060306
- Main IPC: B29C43/00
- IPC: B29C43/00 ; B32B37/00 ; B29C59/00

Abstract:
While releasing property between a resin layer and an imprinting mold is given by using a metal thin film layer, a method for manufacturing a substrate advantageous for forming a conductive layer by plating and a substrate manufactured by the method are provided. According to one aspect of the present invention, a method for manufacturing a substrate by imprinting, the method comprising: laminating a metal thin film layer on top of a resin layer; pressurizing the resin layer and the metal thin film layer by an imprinting mold which comprises a side having a pattern in correspondence with a wiring pattern; curing a resin which forms the resin layer; and removing the imprinting mold from the resin layer and the metal thin film layer, may be presented.
Public/Granted literature
- US20070207297A1 Method for manufacturing substrate by imprinting Public/Granted day:2007-09-06
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