发明授权
- 专利标题: Transistor
- 专利标题(中): 晶体管
-
申请号: US12540230申请日: 2009-08-12
-
公开(公告)号: US08188514B2公开(公告)日: 2012-05-29
- 发明人: Masahiro Sugimoto , Tat-Sing Paul Chow , Zhongda Li , Tetsu Kachi , Tsutomu Uesugi
- 申请人: Masahiro Sugimoto , Tat-Sing Paul Chow , Zhongda Li , Tetsu Kachi , Tsutomu Uesugi
- 申请人地址: US NY Troy JP Toyota-shi
- 专利权人: Rensselaer Polytechnic Institute,Toyota Jidosha Kabushiki Kaisha
- 当前专利权人: Rensselaer Polytechnic Institute,Toyota Jidosha Kabushiki Kaisha
- 当前专利权人地址: US NY Troy JP Toyota-shi
- 代理机构: Kenyon & Kenyon LLP
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
An HEMT type transistor is disclosed that is a normally off type, and in which variations in the gate threshold voltage are small. A transistor is provided with a p-type region, a barrier region, an insulation film, a gate electrode. The channel region is connected to an upper surface of the p-type region. The channel region is n-type or i-type and provided with a first channel region and a second channel region. The barrier region is forming a hetero-junction with an upper surface of the first channel region. The insulation film is connected to an upper surface of the second channel region and an upper surface of the barrier region. The gate electrode faces the second channel region and the barrier region via the insulation film. The first channel region and the second channel region are arranged in series in a current pathway.
公开/授权文献
- US20100038681A1 TRANSISTOR 公开/授权日:2010-02-18
信息查询
IPC分类: