发明授权
- 专利标题: Nonvolatile semiconductor memory device and manufacturing method thereof
- 专利标题(中): 非易失性半导体存储器件及其制造方法
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申请号: US12436580申请日: 2009-05-06
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公开(公告)号: US08188535B2公开(公告)日: 2012-05-29
- 发明人: Yoshinobu Asami
- 申请人: Yoshinobu Asami
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权: JP2008-129961 20080516
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
An object is to suppress reading error even in the case where writing and erasing are repeatedly performed. Further, another object is to reduce writing voltage and erasing voltage while increase in the area of a memory transistor is suppressed. A floating gate and a control gate are provided with an insulating film interposed therebetween over a first semiconductor layer for writing operation and erasing operation and a second semiconductor layer for reading operation which are provided over a substrate; injection and release of electrons to and from the floating gate are performed using the first semiconductor layer; and reading is performed using the second semiconductor layer.
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