Invention Grant
US08193511B2 Method of calibrating beam position in charged-particle beam system 有权
在带电粒子束系统中校准光束位置的方法

  • Patent Title: Method of calibrating beam position in charged-particle beam system
  • Patent Title (中): 在带电粒子束系统中校准光束位置的方法
  • Application No.: US12351276
    Application Date: 2009-01-09
  • Publication No.: US08193511B2
    Publication Date: 2012-06-05
  • Inventor: Kazuya Goto
  • Applicant: Kazuya Goto
  • Applicant Address: JP Tokyo
  • Assignee: JEOL Ltd.
  • Current Assignee: JEOL Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: The Webb Law Firm
  • Priority: JP2008-013541 20080124
  • Main IPC: G01D18/00
  • IPC: G01D18/00
Method of calibrating beam position in charged-particle beam system
Abstract:
A method of calibrating the beam position in a charged-particle beam system starts with finding a focus deviation on the material surface for each point within a deflection field. A focus correction voltage VF necessary to cancel out the focus deviation is determined. A beam position deviation fi per unit focus correction voltage is found. The deflection voltage is corrected so as to cancel out the product fi·VF. The deflection voltage is corrected so as to cancel out the sum of the product fi·VF and the measured deflection field distortion while correcting the focus based on the voltage VF.
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