Invention Grant
- Patent Title: Method and structure for ameliorating side-effects of performing in situ fenestration using a plasma RF catheter
- Patent Title (中): 使用等离子体RF导管进行原位开窗改善副作用的方法和结构
-
Application No.: US12049522Application Date: 2008-03-17
-
Publication No.: US08197475B2Publication Date: 2012-06-12
- Inventor: Walter Bruszewski , Trevor Greenan
- Applicant: Walter Bruszewski , Trevor Greenan
- Applicant Address: US CA Santa Rosa
- Assignee: Medtronic Vascular, Inc.
- Current Assignee: Medtronic Vascular, Inc.
- Current Assignee Address: US CA Santa Rosa
- Main IPC: A61B18/18
- IPC: A61B18/18 ; A61B18/04

Abstract:
When a main stent-graft is placed in a vessel of a patient and a branch vessel is blocked by the main stent-graft, a RF plasma catheter is used to cut out a portion of the graft cloth of the main-stent graft adjacent to an ostium of the branch vessel to be perfused. To ameliorate possible adverse effects associated with the use of the RF plasma catheter, e.g., creation of coagulum, (desiccated, coagulated blood) or perhaps a cut stent strut, a special process using saline flushing, a novel RF plasma catheter with an insulated tip, or a combination of the two is used.
Public/Granted literature
Information query