Invention Grant
- Patent Title: Hollow electrode with film for electrodeposition coating
- Patent Title (中): 空心电极,用于电沉积涂膜
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Application No.: US12296804Application Date: 2007-04-13
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Publication No.: US08197658B2Publication Date: 2012-06-12
- Inventor: Shouhei Matsui , Yasushi Yoshida , Nobuyoshi Shoji , Yukio Matsumura
- Applicant: Shouhei Matsui , Yasushi Yoshida , Nobuyoshi Shoji , Yukio Matsumura
- Applicant Address: JP Osaka-shi JP Chiba-shi
- Assignee: Daiso Co., Ltd.,AGC Engineering Co., Ltd.
- Current Assignee: Daiso Co., Ltd.,AGC Engineering Co., Ltd.
- Current Assignee Address: JP Osaka-shi JP Chiba-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-112005 20060414
- International Application: PCT/JP2007/058179 WO 20070413
- International Announcement: WO2007/119824 WO 20071025
- Main IPC: C25B9/10
- IPC: C25B9/10

Abstract:
In order to solve various problems such as a reduction in a paint resin with the progress of electrodeposition coating treatment and remelting of a coating film or the occurrence of pinholes caused by an increased concentration of an electrolyte as a result of the reduction, upsizing of a hollow electrode with a membrane for electrodeposition coating combined with a barrier membrane (e.g., an ion exchange membrane) and an increase in the number of components should be avoided. In order to realize this, a barrier membrane 20 such as an ion exchange membrane is attached to the exterior surface of an electrode main body 10, which is in a hollow state made of a conductive material and configured so as to allow a liquid to pass through freely between the inside and outside of the electrode serving as a support.
Public/Granted literature
- US20100276280A1 HOLLOW ELECTRODE WITH FILM FOR ELECTRODEPOSITION COATING Public/Granted day:2010-11-04
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