发明授权
US08199303B2 Method of manufacturing a liquid crystal display unit structure including a patterned etch stop layer above a first data line segment
有权
制造液晶显示单元结构的方法,其包括在第一数据线段之上的图案化蚀刻停止层
- 专利标题: Method of manufacturing a liquid crystal display unit structure including a patterned etch stop layer above a first data line segment
- 专利标题(中): 制造液晶显示单元结构的方法,其包括在第一数据线段之上的图案化蚀刻停止层
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申请号: US12274775申请日: 2008-11-20
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公开(公告)号: US08199303B2公开(公告)日: 2012-06-12
- 发明人: Liu-Chung Lee , Hsiang-Lin Lin , Kuo-Yu Huang
- 申请人: Liu-Chung Lee , Hsiang-Lin Lin , Kuo-Yu Huang
- 申请人地址: TW Hsinchu
- 专利权人: Au Optronics Corp.
- 当前专利权人: Au Optronics Corp.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Thomas, Kayden, Horstemeyer & Risley, LLP
- 优先权: TW96150764A 20071228
- 主分类号: G02F1/1343
- IPC分类号: G02F1/1343 ; G02F1/136 ; G02F1/13
摘要:
A liquid crystal display unit structure and the manufacturing method thereof are provided. The method comprises the following steps: forming a patterned first metal layer with a first data line segment and a lower gate pad on a substrate; forming a patterned dielectric layer covering the first data line and the lower gate pad having a plurality of first openings and a second opening therein, forming a patterned second metal layer including a common line, a second data line segment and a upper gate pad, wherein the upper gate pad is electrically connected to the lower gate pad through the first openings, and the second data line segment is electrically connected to the first data line segment through the first openings; finally forming a patterned passivation layer and a patterned transparent conductive layer.
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