Invention Grant
- Patent Title: Vacuum processing apparatus and substrate transfer method
- Patent Title (中): 真空处理装置和基板转印方法
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Application No.: US12873518Application Date: 2010-09-01
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Publication No.: US08202034B2Publication Date: 2012-06-19
- Inventor: Hiroshi Sone , Ryuji Higashisaka , Kazutoshi Yoshibayashi , Tatsunori Sato , Tatsuhiro Takahashi
- Applicant: Hiroshi Sone , Ryuji Higashisaka , Kazutoshi Yoshibayashi , Tatsunori Sato , Tatsuhiro Takahashi
- Applicant Address: JP Kawasaki-shi
- Assignee: Canon Anelva Corporation
- Current Assignee: Canon Anelva Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2009-202184 20090902; JP2010-178994 20100809
- Main IPC: B65G49/07
- IPC: B65G49/07

Abstract:
A robot according to this invention includes a driving mechanism, a first arm rotatably connected to the driving mechanism, a second arm rotatably connected to the first arm, and an X-shaped end effector rotatably disposed at the distal end of the second arm. Of the four distal ends of the end effector, two distal ends include holding units which can hold substrates in one direction, and the remaining two distal ends include holding units which can hold substrates in the opposite direction.
Public/Granted literature
- US20110052349A1 VACUUM PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD Public/Granted day:2011-03-03
Information query
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