发明授权
- 专利标题: Method of manufacturing hollow structural member, substrate for hollow structural member production, and apparatus for manufacturing hollow structural member
- 专利标题(中): 中空构件的制造方法,中空构造体的制造用基板,中空构造体的制造装置
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申请号: US12920554申请日: 2009-03-10
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公开(公告)号: US08202469B2公开(公告)日: 2012-06-19
- 发明人: Toshihiro Kanematsu , Shin-ya Seno
- 申请人: Toshihiro Kanematsu , Shin-ya Seno
- 申请人地址: JP Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Cooper & Dunham LLP
- 优先权: JP2008-059170 20080310
- 国际申请: PCT/JP2009/054985 WO 20090310
- 国际公布: WO2009/113705 WO 20090917
- 主分类号: B29C49/00
- IPC分类号: B29C49/00
摘要:
There is provided a method of manufacturing a hollow structural member suitable for precisely manufacturing a hollow structural member whose pitch space of the hollows is below 30 μm. The method of manufacturing a hollow structural member of this invention is to encapsulate, by using a gas-permeable material in part of a material that constitutes the substrate (5) for manufacturing the hollow structural member, a high-pressure gas by injection in advance, under high-pressure conditions, into the gas-permeable material; to form a plastic deformation film (10) on a surface under reduced-pressure conditions; and to expand and draw the plastic deformation film (10), while preventing the plastic deformation material from entering the recesses (5b), by discharging the high-pressure gas that is encapsulated in the gas-permeable material into each of the recesses (5b), whereby the hollow structural member is manufactured.
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