发明授权
US08202469B2 Method of manufacturing hollow structural member, substrate for hollow structural member production, and apparatus for manufacturing hollow structural member 有权
中空构件的制造方法,中空构造体的制造用基板,中空构造体的制造装置

  • 专利标题: Method of manufacturing hollow structural member, substrate for hollow structural member production, and apparatus for manufacturing hollow structural member
  • 专利标题(中): 中空构件的制造方法,中空构造体的制造用基板,中空构造体的制造装置
  • 申请号: US12920554
    申请日: 2009-03-10
  • 公开(公告)号: US08202469B2
    公开(公告)日: 2012-06-19
  • 发明人: Toshihiro KanematsuShin-ya Seno
  • 申请人: Toshihiro KanematsuShin-ya Seno
  • 申请人地址: JP Tokyo
  • 专利权人: Ricoh Company, Ltd.
  • 当前专利权人: Ricoh Company, Ltd.
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Cooper & Dunham LLP
  • 优先权: JP2008-059170 20080310
  • 国际申请: PCT/JP2009/054985 WO 20090310
  • 国际公布: WO2009/113705 WO 20090917
  • 主分类号: B29C49/00
  • IPC分类号: B29C49/00
Method of manufacturing hollow structural member, substrate for hollow structural member production, and apparatus for manufacturing hollow structural member
摘要:
There is provided a method of manufacturing a hollow structural member suitable for precisely manufacturing a hollow structural member whose pitch space of the hollows is below 30 μm. The method of manufacturing a hollow structural member of this invention is to encapsulate, by using a gas-permeable material in part of a material that constitutes the substrate (5) for manufacturing the hollow structural member, a high-pressure gas by injection in advance, under high-pressure conditions, into the gas-permeable material; to form a plastic deformation film (10) on a surface under reduced-pressure conditions; and to expand and draw the plastic deformation film (10), while preventing the plastic deformation material from entering the recesses (5b), by discharging the high-pressure gas that is encapsulated in the gas-permeable material into each of the recesses (5b), whereby the hollow structural member is manufactured.
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